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Enhancement of nickel silicide formation by use of nickel...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate

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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etch stop layer in poly-metal structures

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etching material and etching process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Patent

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Etching of structures with high topography

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Etching of structures with high topography

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Fabricating method of a metal gate

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Patent

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Fabricating method of gate structure

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Fabricating process for polysilicon gate

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Fabrication method for a gate quality oxide-compound semiconduct

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Patent

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Fabrication method for semiconductor device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Utility Patent

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Fabrication method for semiconductor memory device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Patent

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Fabrication method of semiconductor integrated circuit device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Fabrication method of single electron tunneling device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Fabrication of a gate electrode stack using a patterned oxide la

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Patent

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Fabrication of a notched gate structure for a field effect...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Fabrication of a wide metal silicide on a narrow polysilicon...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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