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Image sensor and method of fabricating the same

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate

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Implant enhancement of titanium silicidation

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Implant screen and method

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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In-situ nitride and oxynitride deposition process in the same ch

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Incorporation of nitrogen-based gas in polysilicon gate...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Inducing strain in the channels of metal gate transistors

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Insitu doped metal policide

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Inspection methods for a semiconductor device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Insulating buffer film and high dielectric constant...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Integrated circuit device and method therefor

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Integrated circuit devices having active regions with...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Integrated circuit fabrication

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Integrated circuit structure with dual thickness cobalt silicide

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Integrated circuit wiring and fabricating method thereof

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Integrated circuit with differing gate oxide thickness and proce

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Integrated etch process for polysilicon/metal gate

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Integration scheme for using silicided dual work function...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Interfacial layer for gate electrode and high-k dielectric...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Interfacial layer for gate electrode and high-k dielectric...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Introduction of metal impurity to change workfunction of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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