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Capping layer for reducing amorphous carbon contamination of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Carrier mobility enhanced channel devices and method of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Channel strain engineering in field-effect-transistor

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Chemical vapor deposition of silicate high dielectric...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Circuit and method for a folded bit line memory cell with...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Cleaning solution and method for selectively removing layer...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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CMOS compatible SOI process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Cmos gate architecture for integration of salicide process in su

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Cmos of semiconductor device and method for manufacturing...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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CMOS semiconductor device having dual-gate electrode constructio

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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CMOS structure including dual metal containing composite gates

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Co-deposition of nitrogen and metal for metal silicide...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Cobalt silicidation using tungsten nitride capping layer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Cobalt silicide structure for improving gate oxide integrity...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Combined gate cap or digit line and spacer deposition using HDP

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Composite spacer scheme with low overlapped parasitic...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Conductive layer forming method using etching mask with directio

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Conductor layer nitridation

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Conductor layer nitridation

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Contact process using taper contact etching and polycide step

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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