Implantation method for simultaneously implanting in one...
Implantation using a hardmask
Implanted asymmetric doped polysilicon gate FinFET
Implanted hidden interconnections in a semiconductor device...
Implanted vertical source-line under straight stack for...
Implanting carbon to form P-type drain extensions
In 2 O 3 thin film resistivity control by doping metal oxide...
In situ, one step, formation of selective hemispherical grain si
In-situ doped rough polysilicon storage cell structure formed us
In-situ etch and pre-clean for high quality thin oxides
In-situ stack for high volume production of isolation regions
Inclusion of nitrogen at the silicon dioxide-silicon carbide...
Inclusion of nitrogen at the silicon dioxide-silicon carbide...
Incorporating dopants to enhance the dielectric properties...
Incorporating silicon atoms into a metal oxide gate dielectric u
Increased capacitance trench capacitor
Increased capacitor surface area via use of an oxide formation a
Increased drive current by isotropic recess etch
Increased effective transistor width using double sidewall space
Increased gate to body coupling and application to DRAM and...