Sacrificial multilayer anti-reflective coating for mos gate...

Sample surface processing method

Sealing porous dielectrics with silane coupling reagents

Selective aluminum plug formation and etchback process

Selective base etching

Selective dry etching method of undoped and doped silicon thin f

Selective etch method for selectively etching a multi-layer...

Selective etch process

Selective etch process for making a semiconductor device...

Selective etching of carbon-doped low-k dielectrics

Selective etching of low-k dielectrics

Selective etching of low-k dielectrics

Selective etching of oxides

Selective etching processes for In 2 O 3 thin films in...

Selective etching processes of silicon nitride and indium...

Selective etching processes of silicon nitride and indium...

Selective fabrication of high capacitance density areas in a...

Selective i-line BARL etch process

Selective oxide-to-nitride etch process using C.sub.4 F.sub.8 /C

Selective plasma etching of silicon nitride in presence of silic