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Reactive ion milling/RIE assisted CMP

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reactive plasma etch cleaning of high aspect ratio openings

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reactor with heated and textured electrodes and surfaces

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduce line end pull back by exposing and etching space...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduced cross-contamination between chambers in a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduced-particle method of processing a semiconductor and/or int

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reducing contamination induced scumming, for semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reducing defect formation within an etched semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reducing particulate contamination during semiconductor device p

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reducing photoresist shrinkage via plasma treatment

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction in mobile ion and metal contamination by varying seaso

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of contact size utilizing formation of spacer material

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of feature critical dimensions

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of feature critical dimensions using multiple masks

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of semiconductor structure damage during reactive ion

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of via etch charging damage through the use of a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Regionally thinned microstructures for microbolometers

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Removal method of organic matter and system for the same

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Removal of copper oxides from integrated interconnects

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Removal of copper oxides from integrated interconnects

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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