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N-containing plasma etch process with reduced resist poisoning

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nano-crystal etch process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nanotopography removing method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Native oxide removal with fluorinated chemistry before...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitride etch using N.sub.2 /Ar/CHF.sub.3 chemistry

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitride offset spacer to minimize silicon recess by using...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitride open etch process based on trifluoromethane and...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitride selective, anisotropic Cl.sub.2 /He etch process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitride semiconductor growing process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitride spacer formation

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitride surface passivation for acid catalyzed chemically...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitrogen-based highly polymerizing plasma process for...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Nitrous oxide stripping process for organosilicate glass

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Non-destructive method for gauging undercut in a hidden layer

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Non-HBr shallow trench isolation etch process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Non-plasma capping layer for interconnect applications

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Notch stop pulsing process for plasma processing system

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Notched gate configuration for high performance integrated...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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