N-containing plasma etch process with reduced resist poisoning
Nano-crystal etch process
Nanotopography removing method
Native oxide removal with fluorinated chemistry before...
Nitride etch using N.sub.2 /Ar/CHF.sub.3 chemistry
Nitride offset spacer to minimize silicon recess by using...
Nitride open etch process based on trifluoromethane and...
Nitride selective, anisotropic Cl.sub.2 /He etch process
Nitride semiconductor growing process
Nitride spacer formation
Nitride surface passivation for acid catalyzed chemically...
Nitrogen-based highly polymerizing plasma process for...
Nitrous oxide stripping process for organosilicate glass
Non-destructive method for gauging undercut in a hidden layer
Non-HBr shallow trench isolation etch process
Non-plasma capping layer for interconnect applications
Notch stop pulsing process for plasma processing system
Notched gate configuration for high performance integrated...