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One mask PT/PCMO/PT stack etching process for RRAM applications

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Operating method of a semiconductor etcher

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optical substrate having alignment fiducials

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optimization of dry etching through the control of helium backsi

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optimized dry etching procedure, using an oxygen containing ambi

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optimized metal etch process to enable the use of aluminum...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Organic BARC with adjustable etch rate

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Organic low K dielectric etch with NH3 chemistry

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Organosilane hardmask compositions and methods of producing...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxide etch process using a mixture of a fluorine-substituted hyd

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxide etch process with high selectivity to nitride suitable...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxide etch process with high selectivity to nitride suitable...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxide etching method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxide etching process using nitrogen plasma

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxide/nitride etching having high selectivity to photoresist

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxygen free plasma stripping process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxygen free plasma stripping process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Oxygen plasma treatment for nitride surface to reduce photo...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ozonated DI water process for organic residue and metal...

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