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Ta-TaN selective removal process for integrated device...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ta-TaN selective removal process for integrated device...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Tapered profile etching method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Technique for etching a low capacitance dielectric layer

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Technique for forming contacts for buried doped regions in a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Technique for reducing contaminants in fabrication of...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Technique for reducing plasma-induced etch damage during the...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Technique for removing resist material after high dose...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for etching a low capacitance dielectric layer on a s

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for etching a silicon dioxide-containing layer

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for etching an oxide layer

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for etching with a photoresist mask

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for forming contact holes through to a silicon...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for forming trenches in a silicon layer of a substrat

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for improving etching in a plasma processing chamber

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for plasma etching silicon-germanium

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for removal of photolithographic films

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Techniques for the use of amorphous carbon (APF) for various...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Thermal annealing method for preventing defects in doped...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Thermal gradient control of high aspect ratio etching and...

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