Selective etch process for making a semiconductor device...

Details Selective etch process for making a semiconductor device... Selective etch process for making a semiconductor device...

2006-05-02

2006-05-02

Chen, Kin-Chan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S745000

Reexamination Certificate

active

07037845

ABSTRACT:
A method for making a semiconductor device is described. That method comprises forming a high-k gate dielectric layer on a substrate, and modifying a first portion of the high-k gate dielectric layer to ensure that it may be removed selectively to a second portion of the high-k gate dielectric layer.

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