E-beam flood exposure of spin-on material to eliminate voids...
Easy to remove hard mask layer for semiconductor device...
Edge defect inhibited trench etch plasma etch method
Effective removal of undesirably formed silicon carbide...
Efficient cleaning by secondary in-situ activation of etch...
Efficient in-situ resist strip process for heavy polymer metal e
Electrical connection pattern in an electronic panel
Electrical standoff having a transmission structure and...
Electrode for generating a plasma and a plasma processing...
Electrode for plasma processes and method for a manufacture...
Electron beam treatment of fluorinated silicate glass
Electron-beam cell projection aperture formation method
Electrostatic control of deposition of, and etching by,...
Elimination of resist footing on tera hardmask
Elimination/reduction of black silicon in DT etch
End point determination of process residues in wafer-less...
Endpoint control for small open area by RF source parameter Vdc
Endpoint detection for high density plasma (HDP) processes
Endpoint detection in the etching of dielectric layers
Endpoint detection method and apparatus