Etch compositions and methods of processing a substrate

Etch damage repair with thermal annealing

Etch depth control for dual damascene fabrication process

Etch features with reduced line edge roughness

Etch method using a dielectric etch chamber with expanded...

Etch methods to form anisotropic features for high aspect...

Etch of silicon nitride selective to silicon and silicon...

Etch of silicon nitride selective to silicon and silicon...

Etch process for dielectric materials comprising oxidized...

Etch process for fabricating a vertical hard mask/conductive...

Etch process for forming contacts over titanium silicide

Etch process for forming high aspect ratio trenched in silicon

Etch process for recessing polysilicon in trench structures

Etch process that resists notching at electrode bottom

Etch process to produce rounded top corners for sub-micron silic

Etch process with controlled critical dimension shrink

Etch rate loading improvement

Etch selectivity inversion for etching along...

Etch stop control for MEMS device formation

Etch stop layer for etching FinFET gate over a large topography