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IC mechanical planarization process incorporating two slurry com

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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IC mechanical planarization process incorporating two slurry com

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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III-V compound semiconductor substrate manufacturing method

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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ILD planarization method

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Implementation of Si-Ge HBT with CMOS process

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Imprint stamp

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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In situ and ex situ hardmask process for STI with oxide...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In situ application of etch back for improved deposition...

Semiconductor device manufacturing: process – Chemical etching
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In situ application of etch back for improved deposition...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In situ chemical generator and method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In situ dry cleaning process for poly gate etch

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In situ etch process for insulating and conductive materials

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In situ Etching of inorganic dielectric anti-reflective coating

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In situ liner barrier

Semiconductor device manufacturing: process – Chemical etching
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In situ method for cleaning silicon surface and forming...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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In situ method for CMP endpoint detection

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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In situ photoresist hot bake in loading chamber of dry etch

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In situ wafer cleaning process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In situ wafer heat for reduced backside contamination

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In-situ balancing for phase-shifting mask

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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