N-containing plasma etch process with reduced resist poisoning

N2/H2 chemistry for dry development in top surface imaging...

Nano-crystal etch process

Nanocircuit and self-correcting etching method for...

Nanoparticles and method for making the same

Nanoparticles and method for making the same

Nanotopography removing method

Narrow channel width effect modification in a shallow trench...

Native oxide removal with fluorinated chemistry before...

Negative tone double patterning method

NH3 plasma descumming and resist stripping in semiconductor...

Nitride etch using N.sub.2 /Ar/CHF.sub.3 chemistry

Nitride offset spacer to minimize silicon recess by using...

Nitride open etch process based on trifluoromethane and...

Nitride selective, anisotropic Cl.sub.2 /He etch process

Nitride semiconductor growing process

Nitride spacer formation

Nitride surface passivation for acid catalyzed chemically...

Nitrogen treatment of polished halogen-doped silicon glass

Nitrogen-based highly polymerizing plasma process for...