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Calibration standard for profilometers and manufacturing procedu

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Capacitively coupled plasma reactor with magnetic plasma...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Capacitor fabricating method of semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Capping layer for a semiconductor device and a method of...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Capping layer for crystallizing germanium, and substrate...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Carbon precursors for use during silicon epitaxial film...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Carbon-conductive ink resistor printed circuit board and its...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Carboxylic acid etching solution and method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Caro's cleaning of SOG control wafer residue

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Carrier gas modification for use in plasma ashing of...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Carrier head for chemical mechanical polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Carrier substrate for producing semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Catalyst patterning for nanowire devices

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Catalytic acceleration and electrical bias control of CMP proces

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Ceria based slurry for chemical-mechanical polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cerium oxide abrasive for polishing insulating films formed...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cerium oxide abrasives for chemical mechanical polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Cerium oxide abrasives for chemical mechanical polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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CF4+H2O plasma ashing for reduction of contact/via...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Chemical mechanical planarization of conductive material

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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