Calibration standard for profilometers and manufacturing procedu
Capacitively coupled plasma reactor with magnetic plasma...
Capacitor fabricating method of semiconductor device
Capping layer for a semiconductor device and a method of...
Capping layer for crystallizing germanium, and substrate...
Carbon precursors for use during silicon epitaxial film...
Carbon-conductive ink resistor printed circuit board and its...
Carboxylic acid etching solution and method
Caro's cleaning of SOG control wafer residue
Carrier gas modification for use in plasma ashing of...
Carrier head for chemical mechanical polishing
Carrier substrate for producing semiconductor device
Catalyst patterning for nanowire devices
Catalytic acceleration and electrical bias control of CMP proces
Ceria based slurry for chemical-mechanical polishing
Cerium oxide abrasive for polishing insulating films formed...
Cerium oxide abrasives for chemical mechanical polishing
Cerium oxide abrasives for chemical mechanical polishing
CF4+H2O plasma ashing for reduction of contact/via...
Chemical mechanical planarization of conductive material