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Ultra-high oxide to photoresist selective etch of...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ultra-thin resist and barrier metal/oxide hard mask for...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ultra-thin resist and nitride/oxide hard mask for metal etch

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ultra-thin Si MOSFET device structure and method of manufacture

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Ultrasonic assisted etch using corrosive liquids

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Ultrasonic processing of chemical mechanical polishing slurries

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Ultrasonic processing of chemical mechanical polishing slurries

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Ultrasonic-wave washing unit, ultrasonic-wave washing...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Undercut process with isotropic plasma etching at package level

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Undoped and fluorinated amorphous carbon film as pattern...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Undoped silicon dioxide as etch mask for patterning of doped...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Undoped silicon dioxide as etch stop for selective etch of...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Uniform dopant distribution for mesas of semiconductors

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Uniform gas flow arrangements

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Unique chemical mechanical planarization approach which utilizes

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Unique process chemistry for etching organic low-k materials

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Unlanded via structure and method for making same

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Use of a plasma source to form a layer during the formation...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Use of a plasma source to form a layer during the formation...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Use of a polish stop layer in the formation of metal structures

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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