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Backside chemical etching and polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Backside etch process chamber and method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Backside integrated circuit die surface finishing technique...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Backside unlayering of MOSFET devices for electrical and...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Backside unlayering of MOSFET devices for electrical and...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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BARC shaping for improved fabrication of dual damascene...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Barrier layer buffing after Cu CMP

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Barrier metal film production apparatus, barrier metal film...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Barrier metal film production method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Barrier polishing solution

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Basic material for patterning and patterning method

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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BC13/AR chemistry for metal overetching on a high density...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Beat frequency modulation for plasma generation

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Bi-directional processing chamber and method for...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Bi-layer resist process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Bi-level resist structure and fabrication method for contact...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Bi-level resist structure and fabrication method for contact...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Bias plasma deposition for selective low dielectric insulation

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Biased H 2 etch process in deposition-etch-deposition gap fill

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Bilayer anti-reflective coating and etch hard mask

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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