Radially oscillating carousel processing system for chemical mec
Radiation-resistant zone plates and method of manufacturing...
Reactive ion etch method for forming vias through nitrogenated s
Reactive ion milling/RIE assisted CMP
Reactive plasma etch cleaning of high aspect ratio openings
Reactor for processing a semiconductor wafer
Reactor for processing a semiconductor wafer
Reactor for processing a workpiece using sonic energy
Reactor with heated and textured electrodes and surfaces
Ready-to-use stable chemical-mechanical polishing slurries
Real-time control of chemical-mechanical polishing...
Recessing trench to target depth using feed forward data
Recovery of damages in a field oxide caused by high energy...
Redistribution of copper deposited films
Reduce line end pull back by exposing and etching space...
Reduced cross-contamination between chambers in a...
Reduced pad erosion
Reduced silicon gouging and common source line resistance in...
Reduced size etching method for integrated circuits
Reduced-particle method of processing a semiconductor and/or int