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Off-concentric polishing system design

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate

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On-chip pad conditioning for chemical mechanical polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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One mask PT/PCMO/PT stack etching process for RRAM applications

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ono etch using CL2/HE chemistry

Semiconductor device manufacturing: process – Chemical etching
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Operating method of a semiconductor etcher

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optical article, exposure apparatus or optical system using...

Semiconductor device manufacturing: process – Chemical etching
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Optical device having micro lens array and method for...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Optical illumination system and projection apparatus

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Optical substrate having alignment fiducials

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optimal tungsten through wafer via and process of...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Optimization methods for on-chip interconnect geometries...

Semiconductor device manufacturing: process – Chemical etching
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Optimization of dry etching through the control of helium backsi

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optimized dry etching procedure, using an oxygen containing ambi

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optimized metal etch process to enable the use of aluminum...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Optimized trench/via profile for damascene filling

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Optimized trench/via profile for damascene filling

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Optimized trench/via profile for damascene processing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Optimized underlayer structures for maintaining chemical mechani

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Organic BARC with adjustable etch rate

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Organic low K dielectric etch with NH3 chemistry

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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