Reduced size etching method for integrated circuits
Reducing contamination of semiconductor substrates during...
Reducing contamination of semiconductor substrates during...
Reducing feature dimension using self-assembled monolayer
Reducing pitch with continuously adjustable line and space dimen
Reduction of feature critical dimensions
RELACS shrink method applied for single print resist mask...
Removable photoresist spacers in CMOS transistor fabrication
Removal of silicon oxycarbide from substrates
Removal of SiON ARC film after poly photo and etch
Resolving of fluorine loading effect in the vacuum chamber
Reticle fabrication using a removable hard mask
Reticle fabrication using a removable hard mask
Retrograde openings in thin films
Reverse masking profile improvements in high aspect ratio etch
Reverse masking profile improvements in high aspect ratio etch
Ridge waveguide type distributed feedback semiconductor laser de
Sacrificial dielectric planarization layer
Sacrificial etchback layer for improved spin-on-glass planarizat
Scum solution for chemically amplified resist patterning in...