Deep filled vias

Defect reduction of non-polar and semi-polar III-nitrides...

Defect-minimizing, topology-independent planarization of...

Deliberate semiconductor film variation to compensate for...

Deliberate semiconductor film variation to compensate for...

Delineation pattern for epitaxial depositions

Dendritic material sacrificial layer micro-scale gap...

Device and method to eliminate shorting induced by via to...

Differential trench open process

Double mask self-aligned double patterning technology...

Double patterning strategy for contact hole and trench in...

Double patterning techniques and structures

Double spacer FinFET formation

Double-sided etching technique for semiconductor structure...

Dry etching method

Dry etching process for compound semiconductors

Dry-etching method

Dry-wet-dry solvent-free process after stop layer etch in...

Dual damascene aperture formation method absent intermediate...

Dual damascene flowable oxide insulation structure and...