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Partial via hard mask open on low-k dual damascene etch with...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Passivation layer for a metal film to prevent metal corrosion

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Passivation of porous semiconductors for improved optoelectronic

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Pattern forming method and manufacturing method of...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Patterned structures fabricated by printing mask over...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Patterning sub-lithographic features with variable widths

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Photolithographic patterning process using a carbon hard...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Photoresist scum for copper dual damascene process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Pillar process for copper interconnect scheme

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Pitch multiplication using self-assembling materials

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Pitch reduction

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Pitch reduction

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Pitch reduction in semiconductor fabrication

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Pitch reduction using a set of offset masks

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Planarization of a patterned structure on a substrate using an i

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Planarization of insulation film using low wettingness surface

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Planarization process for semiconductor substrates

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Planarization process using tailored etchback and CMP

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Plasma and electron beam etching device and method

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Plasma dielectric etch process including ex-situ backside...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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