Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Patent
1996-08-07
1999-03-09
Utech, Benjamin
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
438 31, 438 32, H01L 21302
Patent
active
058800280
ABSTRACT:
A ridge waveguide type distributed feedback semiconductor laser device includes a diffraction grating formed on a surface of a semiconductor wafer, a semiconductor layer formed on the diffraction grating, the semiconductor layer serving to alleviate the irregularity of the diffraction grating, and a stripe-like ridge having a cladding layer and a contact layer formed on the semiconductor layer. Also, a method for manufacturing the ridge waveguide type distributed feedback semiconductor laser device is disclosed.
REFERENCES:
patent: 4704720 (1987-11-01), Yamaguchi et al.
patent: 4782035 (1988-11-01), Fujiwara
patent: 5140149 (1992-08-01), Sakata et al.
patent: 5358896 (1994-10-01), Komatsu et al.
Hiramatsu Takuma
Takahashi Koji
Taneya Mototaka
Yamamoto Kei
Goudreau George
Sharp Kabushiki Kaisha
Utech Benjamin
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