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Achievement of top rounding in shallow trench etch

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Actuating transistor including reduced channel length

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Adding SF.sub.6 gas to improve metal undercut for hardmask metal

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Adhesion layer for etching of tracks in nuclear trackable...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Air gap formation

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Apparatus and method for surface finishing a silicon film

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Apparatus and method of fabricating thin film transistor...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Apparatus and methods for processing a workpiece

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Apparatus and methods for processing a workpiece

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Apparatus for processing a workpiece

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Autoaligned etching process for realizing word lines in memory d

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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