Radiation-resistant zone plates and method of manufacturing...
Reactor for processing a semiconductor wafer
Reactor for processing a semiconductor wafer
Reactor for processing a workpiece using sonic energy
Recessing trench to target depth using feed forward data
Redistribution of copper deposited films
Reduced silicon gouging and common source line resistance in...
Reduced size etching method for integrated circuits
Reducing contamination of semiconductor substrates during...
Reducing contamination of semiconductor substrates during...
Reducing feature dimension using self-assembled monolayer
Reducing pitch with continuously adjustable line and space dimen
Reduction of feature critical dimensions
RELACS shrink method applied for single print resist mask...
Removable photoresist spacers in CMOS transistor fabrication
Removal of silicon oxycarbide from substrates
Removal of SiON ARC film after poly photo and etch
Resolving of fluorine loading effect in the vacuum chamber
Reticle fabrication using a removable hard mask
Reticle fabrication using a removable hard mask