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Hard mask patterns of a semiconductor device and a method...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Hard mask structure for deep trenched super-junction device

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Hard masking method for forming residue free oxygen...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Hardmask of amorphous carbon-hydrogen (a-C:H) layers with...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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HDP-CVD dep/etch/dep process for improved deposition into...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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HDP-CVD method for spacer formation

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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HDP-CVD multistep gapfill process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High aspect ratio shallow trench using silicon implanted oxide

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High density plasma chemical vapor deposition process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High density plasma chemical vapor deposition process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High density selective SiO.sub.2 :Si.sub.3 N.sub.4 etching using

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High resist-selectivity etch for silicon trench etch...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High selectivity BPSG to TEOS etchant

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High selectivity collar oxide etch processes

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High selectivity SiC etch in integrated circuit fabrication

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High sensitive micro-cantilever sensor and fabricating...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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High-density plasma (HDP) chemical vapor deposition (CVD)...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Hole pattern forming method and semiconductor device...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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