Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2005-07-19
2005-07-19
Picardat, Kevin M. (Department: 2822)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S782000, C438S787000, C438S791000
Reexamination Certificate
active
06919277
ABSTRACT:
Methods and apparatuses are disclosed that can introduce deliberate semiconductor film variation during semiconductor manufacturing to compensate for radial processing differences, to determine optimal device characteristics, or produce small production runs. The present invention radially varies the thickness and/or composition of a semiconductor film to compensate for a known radial variation in the semiconductor film that is caused by performing a subsequent semiconductor processing step on the semiconductor film.
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Furukawa Toshiharu
Hakey Mark C.
Holmes Steven J.
Horak David V.
International Business Machines - Corporation
Picardat Kevin M.
Sabo William D.
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