Implanting carbon to form P-type drain extensions

In 2 O 3 thin film resistivity control by doping metal oxide...

In situ, one step, formation of selective hemispherical grain si

In-situ doped rough polysilicon storage cell structure formed us

In-situ etch and pre-clean for high quality thin oxides

In-situ stack for high volume production of isolation regions

Inclusion of nitrogen at the silicon dioxide-silicon carbide...

Inclusion of nitrogen at the silicon dioxide-silicon carbide...

Incorporating dopants to enhance the dielectric properties...

Incorporating silicon atoms into a metal oxide gate dielectric u

Increased capacitance trench capacitor

Increased capacitor surface area via use of an oxide formation a

Increased drive current by isotropic recess etch

Increased effective transistor width using double sidewall space

Increased gate to body coupling and application to DRAM and...

Increased interior volume for integrated memory cell

Increased surface area capacitor via use of a novel reactive ion

Increased surface area of an STC structure via the use of a stor

Increasing adherence of dielectrics to phase change materials

Increasing capacitance for high density DRAM by microlithography