Implanting carbon to form P-type drain extensions
In 2 O 3 thin film resistivity control by doping metal oxide...
In situ, one step, formation of selective hemispherical grain si
In-situ doped rough polysilicon storage cell structure formed us
In-situ etch and pre-clean for high quality thin oxides
In-situ stack for high volume production of isolation regions
Inclusion of nitrogen at the silicon dioxide-silicon carbide...
Inclusion of nitrogen at the silicon dioxide-silicon carbide...
Incorporating dopants to enhance the dielectric properties...
Incorporating silicon atoms into a metal oxide gate dielectric u
Increased capacitance trench capacitor
Increased capacitor surface area via use of an oxide formation a
Increased drive current by isotropic recess etch
Increased effective transistor width using double sidewall space
Increased gate to body coupling and application to DRAM and...
Increased interior volume for integrated memory cell
Increased surface area capacitor via use of a novel reactive ion
Increased surface area of an STC structure via the use of a stor
Increasing adherence of dielectrics to phase change materials
Increasing capacitance for high density DRAM by microlithography