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Semiconductor device with a reduced width gate dielectric and me

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor device with dummy electrode

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor device with dummy electrode

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor device with gate space of positive slope and...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor device with non-deposited barrier layer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor device, and method for manufacturing the same

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor devices and methods for fabricating the same

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor devices and methods for forming semiconductor...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor devices and methods of fabricating the same

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor devices having contact plugs and local...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor fin integration using a sacrificial fin

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor integrated circuit device and method for...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor memory device and manufacturing method therefor

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor memory device and method for manufacturing the...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor process with deuterium predominance at high temper

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor processing employing a semiconductor spacer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor processing method of forming a conductive gate lin

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor processing method of forming a conductive...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor processing methods

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Semiconductor processing methods of forming a conductive gate an

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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