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Reducing CMP scratch, dishing and erosion by post CMP etch...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Reducing contamination induced scumming, for semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reducing contamination of semiconductor substrates during...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Reducing contamination of semiconductor substrates during...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Reducing defect formation within an etched semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reducing feature dimension using self-assembled monolayer

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Reducing particulate contamination during semiconductor device p

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reducing photoresist shrinkage via plasma treatment

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reducing pitch with continuously adjustable line and space dimen

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Reduction in mobile ion and metal contamination by varying seaso

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of contact size utilizing formation of spacer material

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of feature critical dimensions

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Reduction of feature critical dimensions

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of feature critical dimensions using multiple masks

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of semiconductor structure damage during reactive ion

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Reduction of surface roughness during chemical mechanical...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Reduction of surface roughness during chemical mechanical...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Reduction of tungsten damascene residue

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Reduction of via etch charging damage through the use of a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Regionally thinned microstructures for microbolometers

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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