Reduction in mobile ion and metal contamination by varying seaso

Details Reduction in mobile ion and metal contamination by varying seaso Reduction in mobile ion and metal contamination by varying seaso

1996-08-19

1998-09-22

Breneman, R. Bruce

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

438905, 134 11, 134 4, 216 67, H01L 2100

Patent

active

058113568

ABSTRACT:
The present invention provides a method and apparatus for reducing the concentration of mobile ion and metal contaminants in a processing chamber by increasing the bias RF power density to greater than 0.051 W/mm.sup.2 and increasing the season time to greater than 30 seconds, during a chamber seasoning step. The method of performing a season step in a chamber by depositing a deposition material under the combined conditions of a bias RF power density of about 0.095 W/mm.sup.2 and a season time of from about 50 to about 70 seconds, reduces the mobile ion and metal contaminant concentrations within the chamber by about one order of magnitude.

REFERENCES:
patent: 4795880 (1989-01-01), Hayes et al.
patent: 5041311 (1991-08-01), Tsukune et al.
patent: 5514246 (1996-05-01), Blalock
patent: 5589041 (1996-12-01), Lantsman
patent: 5599396 (1997-02-01), Sandhu

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