Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2005-01-11
2005-01-11
Chen, Kin-Chan (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C385S051000
Reexamination Certificate
active
06841486
ABSTRACT:
A process comprising: (a) applying a stop etch mask to a substrate, the mask defining the location on the substrate of a groove for receiving a waveguide and one or more fiducials for positioning the optical device on the substrate relative to the waveguide; and (b) etching the substrate to define the fiducials and the groove, the groove being dimensioned to receive at least a portion of a waveguide and the fiducials enabling the optical device to be positioned on the substrate such that it is optically aligned with the waveguide.
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patent: 6163639 (2000-12-01), Ollier et al.
patent: 6344148 (2002-02-01), Park et al.
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patent: 6516448 (2003-02-01), Vieider et al.
Boudreau Robert Addison
Drabenstadt Christian
Schramm Jeffery Emerson
Chen Kin-Chan
Tyco Electronics Corporation
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