Optical substrate having alignment fiducials

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

Reexamination Certificate

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C385S051000

Reexamination Certificate

active

06841486

ABSTRACT:
A process comprising: (a) applying a stop etch mask to a substrate, the mask defining the location on the substrate of a groove for receiving a waveguide and one or more fiducials for positioning the optical device on the substrate relative to the waveguide; and (b) etching the substrate to define the fiducials and the groove, the groove being dimensioned to receive at least a portion of a waveguide and the fiducials enabling the optical device to be positioned on the substrate such that it is optically aligned with the waveguide.

REFERENCES:
patent: 5550088 (1996-08-01), Dautartas et al.
patent: 5981975 (1999-11-01), Imhoff
patent: 6163639 (2000-12-01), Ollier et al.
patent: 6344148 (2002-02-01), Park et al.
patent: 6483969 (2002-11-01), Yap et al.
patent: 6516448 (2003-02-01), Vieider et al.

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