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Gas phase removal of SiO.sub.2 /metals from silicon

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Gas pulsing for etch profile control

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Gas switching during an etch process to modulate the...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Gas switching during an etch process to modulate the...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Gas-assisted etch with oxygen

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Gate etch process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Gate etch process with extended CD trim capability

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Gate insulator pre-clean procedure

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Gate oxide stabilization by means of germanium components in...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Gate patterning of nano-channel devices

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Gate stack and etch process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Gate structure and method

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Gate structure and method of manufacture

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Gate trim process using either wet etch or dry etch approach...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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GCIB processing of integrated circuit interconnect structures

Semiconductor device manufacturing: process – Chemical etching
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GCIB processing to improve interconnection vias and improved...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Glass substrate for magnetic recording medium, magnetic...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Global planarization method

Semiconductor device manufacturing: process – Chemical etching – Having liquid and vapor etching steps
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Global planarization method and apparatus

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Global planarization process for high step DRAM devices via...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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