Global planarization method

Details Global planarization method Global planarization method

2005-04-26

2005-04-26

Goudreau, George A. (Department: 1763)

Semiconductor device manufacturing: process

Chemical etching

Having liquid and vapor etching steps

C438S692000, C438S694000, C438S725000, C216S088000

Reexamination Certificate

active

06884729

ABSTRACT:
Methods for manufacturing substrates with difficult to polish features using reverse mask etching and chemical mechanical planarization techniques.

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