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High performance 3D FET structures, and methods for forming...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High precision pattern forming method of manufacturing a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High resolution patterning of surface energy utilizing high...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High selectivity and residue free process for metal on thin...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High selectivity BPSG:TiSi.sub.2 contact etch process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High selectivity etching of a lead overlay structure

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High selectivity etching process for metal gate N/P patterning

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High selectivity etching stop layer for damascene process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High selectivity oxide etch process for integrated circuit...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High selectivity pad etch for thick topside stacks

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High selectivity, low etch depth micro-loading process for...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High speed high power nitride semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High speed silicon etching method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High temperature silicon surface providing high selectivity...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High temperature tungsten etching process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High throughput planarization etch process for interlayer oxide

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High yield plasma etch process for interlayer dielectrics

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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High-density plasma process for filling high aspect ratio...

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High-density SOI cross-point memory array and method for...

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High-K gate dielectric stack plasma treatment to adjust...

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