High selectivity etching of a lead overlay structure

Details High selectivity etching of a lead overlay structure High selectivity etching of a lead overlay structure

2005-01-04

2005-01-04

Goudreau, George A. (Department: 1763)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S010000, C438S017000, C438S734000, C216S013000, C216S015000, C216S058000

Reexamination Certificate

active

06838389

ABSTRACT:
A multi-step etching process for a lead overlay structure such as a thin-film magnetic head structure using secondary ion mass spectroscopy (SIMS) whereby high selectivity of a lead material or other high conductivity metal layer is realized versus that of a metallic mask material and stopping layer. The first step includes patterning the mask layer using IBE or RIE. Advantageously, a photoresist layer is present over a portion of the mask layer and is left in place to be removed in a subsequent step. The second step includes etching the high conductivity metal layer using CAIBE or RIBE with an inert/reactive gas mixture and using SIMS to detect when the stopping layer is reached. The gas mixture comprises an inert gas and a reactive gas that is either oxygen, nitrogen, or a combination of oxygen and nitrogen, whereby the ionized gas mixture contains ions that increase the sensitivity of the SIMS yield of the stopping layer such that the end point of the high conductivity metal layer is detected and etching can then be stopped at the appropriate time. The chemistry of the second etching step is effective to also remove the photoresist at a high etch rate. The third step includes etching the stopping layer with IBE using an inert gas, advantageously with a high angle of about 40-70°. The third step may also be effective to etch debris redeposited on the sidewalls of the structure, and to remove all or a portion of the remaining mask layer.

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