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Methods of patterning substrates

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Methods of providing an adhesion layer for adhesion of...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Methods to form oxide-filled trenches

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Methods to reduce the critical dimension of semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Microelectronic device having disposable spacer

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Micromechanical system fabrication method using (111) single cry

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Micromechanical system fabrication method using (111) single...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Microstructure producing method capable of controlling...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Modified facet etch to prevent blown gate oxide and increase...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Modified facet etch to prevent blown gate oxide and increase...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Monolithic low dielectric constant platform for passive...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Multi-layer hard mask for deep trench silicon etch

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Multi-layer interconnect with isolation layer

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Multi-layer interconnect with isolation layer

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Multi-purpose composite mask for dual damascene patterning

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Multi-step selective etching for cross-point memory

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Multiple etch method for optimizing Inter-Metal Dielectric (IMD)

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Multiple etch methods for forming contact holes in microelectron

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