Microelectronic device having disposable spacer

Details Microelectronic device having disposable spacer Microelectronic device having disposable spacer

2007-04-10

2007-04-10

Crane, Sara (Department: 2811)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S595000, C438S725000, C438S780000

Reexamination Certificate

active

10728995

ABSTRACT:
A method of manufacturing a microelectronic device comprising forming a patterned feature over a substrate and employing a fluorine-containing plasma source to deposit a conformal polymer layer over the patterned feature and the substrate. The polymer layer is etched to expose the patterned feature and a portion of the substrate, thereby forming polymer spacers on opposing sides of the patterned feature.

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