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Dual gate nitride process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Dual insulating layer methods for forming integrated circuit gat

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Dual layer etch stop barrier

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Dual layer etch stop barrier

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Dual layer patterning scheme to make dual damascene

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Dual slurry particle sizes for reducing microscratching of...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Dual temperature nitride strip process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Dual trench alternating phase shift mask fabrication

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Dual trench alternating phase shift mask fabrication

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Dual-gate structure and method of fabricating integrated...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Dual-mask etch of dual-poly gate in CMOS processing

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Dual-source plasma etchers, dual-source plasma etching methods,

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Dual-tank etch method for oxide thickness control

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Dual-tank etch method for oxide thickness control

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Dummy structures that protect circuit elements during polishing

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Dynamic contamination control of equipment controlled by a...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Dynamic feed forward temperature control to achieve CD...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Dynamically adjustable slurry feed arm for wafer edge...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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