Reactive ion milling/RIE assisted CMP

Details Reactive ion milling/RIE assisted CMP Reactive ion milling/RIE assisted CMP

2007-05-15

2007-05-15

Estrada, Michelle (Department: 2823)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S003000, C438S064000, C438S712000, C257SE21218, C360S097010, C360S125020, C029S603070, C029S603160

Reexamination Certificate

active

10792330

ABSTRACT:
A method for forming a high aspect ratio magnetic structure in a magnetic write head using a combination of chemical mechanical polishing and reactive ion etching.

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