Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-04-04
2006-04-04
Chen, Kin-Chan (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S714000, C156S345420, C118S719000
Reexamination Certificate
active
07022613
ABSTRACT:
In accordance with one aspect of the present invention, a method is provided for transporting a workpiece in a semiconductor processing apparatus comprising a transfer chamber, a process chamber, and a gate valve between the transfer chamber and the process chamber. The method comprises vacuum pumping the transfer chamber to achieve a first pressure in the transfer chamber and vacuum pumping the process chamber to achieve a second pressure in the process chamber. An inert gas is flowed into the transfer chamber and shut off in the process chamber. The transfer chamber is isolated from pumping, but pumping continues from the process chamber. The gate valve is opened after isolating the transfer chamber from pumping. The workpiece is then transferred between the transfer chamber and the process chamber. A definitive flow direction from transfer chamber to process chamber is thereby achieved, minimizing risk of back-diffusion.
REFERENCES:
patent: 4828224 (1989-05-01), Crabb et al.
patent: 4889609 (1989-12-01), Cannella
patent: 5186718 (1993-02-01), Tepman et al.
patent: 5286296 (1994-02-01), Sato et al.
patent: 5601686 (1997-02-01), Kawamura et al.
patent: 5609689 (1997-03-01), Kato et al.
patent: 5611655 (1997-03-01), Fukasawa et al.
patent: 5647945 (1997-07-01), Matsuse et al.
patent: 5651868 (1997-07-01), Canady et al.
patent: 5784799 (1998-07-01), Tsubone et al.
patent: 5785796 (1998-07-01), Lee
patent: 5810942 (1998-09-01), Cavaliere et al.
patent: 5820692 (1998-10-01), Baecker et al.
patent: 5913978 (1999-06-01), Kato et al.
patent: 5934856 (1999-08-01), Asakawa et al.
patent: 5981399 (1999-11-01), Kawamura et al.
patent: 6042623 (2000-03-01), Edwards
patent: 6048154 (2000-04-01), Wytman
patent: 6106634 (2000-08-01), Ghanayem et al.
patent: 6224312 (2001-05-01), Sundar
patent: 6224679 (2001-05-01), Sasaki et al.
patent: 6286230 (2001-09-01), White et al.
patent: 6312525 (2001-11-01), Bright et al.
patent: 6488778 (2002-12-01), Ballantine et al.
patent: 6536136 (2003-03-01), Saga
patent: 6828235 (2004-12-01), Takano
patent: 2001/0000759 (2001-05-01), Doley et al.
patent: 2002/0020344 (2002-02-01), Takano
patent: WO 01/04935 (2001-01-01), None
Jylhä Olli
Pomarede Christophe
Shero Eric J.
ASM America Inc.
Chen Kin-Chan
Knobbe Martens Olson & Bear LLP
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