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  5. Gas phase etching of substrate
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Plasma etching of polysilicon using fluorinated gas mixtures

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma etching of silicon using fluorinated gas mixtures

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma generating apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma generation and control using a dual frequency RF source

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Plasma process for etching multicomponent alloys

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and a plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and control method thereof

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Plasma processing apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate
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Plasma processing apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and method with controlled...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate
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Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing apparatus and processing method

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Plasma processing comprising three rotational motions of an...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma processing method

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate
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