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Scavenging fluorine in a planar inductively coupled plasma...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selective etch for uniform metal trace exposure and milling...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selective etch process of a sacrificial light absorbing...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selective etch process of a sacrificial light absorbing...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selective etching method for stacked organic film

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selective etching of thin films

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selective etching processes of SiO 2 , Ti and In 2 O 3...

Etching a substrate: processes – Gas phase etching of substrate – Etching a multiple layered substrate where the etching...
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Selective etching processes of SiO 2 , Ti and In 2 O 3...

Etching a substrate: processes – Gas phase etching of substrate – Etching a multiple layered substrate where the etching...
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Selective nitride: oxide anisotropic etch process

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selective removal of dielectric materials and plating...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selective removal of material by irradiation

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Selectively etching silicon using fluorine without plasma

Etching a substrate: processes – Gas phase etching of substrate – Etching a multiple layered substrate where the etching...
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Self aligned contact etch using difluoromethane and trifluoromet

Etching a substrate: processes – Gas phase etching of substrate – Etching a multiple layered substrate where the etching...
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Self-cleaning etch process

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Self-cleaning plasma processing reactor

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Self-cleaning polymer-free top electrode for parallel electrode

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Semiconductor device manufacturing method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Semiconductor integrated circuit arrangement fabrication method

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Semiconductor processor with wafer face protection

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Semiconductor substrate with trenches of varying depth

Etching a substrate: processes – Gas phase etching of substrate – Irradiating – ion implanting – alloying – diffusing – or...
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