LandOfFree - US Patents - Listing for Etching a substrate: processes,Gas phase etching of substrate

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Capture system employing diverter fluid nozzle

Etching a substrate: processes – Gas phase etching of substrate

Cleaning gases and etching gases

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Cleaning of multicompositional etchant residues

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate

Coating for forming a high definition aperture

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Composite shadow ring equipped with a sacrificial inner ring

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Composition and method for polishing...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Confinement device for use in dry etching of substrate...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Confinement ring drive

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Contaminant removal by laser-accelerated fluid

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Control of etch selectivity

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Control of ion angular distribution function at wafer surface

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Control of semiconductor processing

Etching a substrate: processes – Gas phase etching of substrate

Controlled etching of oxides via gas phase reactions

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Controlled method for segmented electrode apparatus and...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Controlled polymerization on plasma reactor wall

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Controlled potential plasma source

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Controlling plasma processing using parameters derived...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...

Copper-clad board suitable for making hole with carbon...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting

Critical dimension control in a semiconductor fabrication...