Ultraviolet blocking layer

Undercut and residual spacer prevention for dual stressed...

Uniaxial strain relaxation of biaxial-strained thin films...

Uniform dielectric layer and method to form same

Uniformly doped source/drain junction in a double-gate MOSFET

Unit cell layout and transfer gate design for high density DRAMs

Universal charge port connector for electric vehicles

Use of a grated top surface topography for capacitor structures

Use of a hard mask in the manufacture of a semiconductor device

Use of a metal contact structure to increase control gate coupli

Use of a rapid thermal anneal process to control drive current

Use of a selective hard mask for the integration of double...

Use of a single mask during the formation of a transistor's...

Use of a thin nitride spacer in a split gate embedded analog...

Use of a wet etch dip step used as part of a self-aligned...

Use of an etch to reduce the thickness and around the edges...

Use of atomic oxygen process for improved barrier layer

Use of borophosphorous tetraethyl orthosilicate (BPTEOS) to impr

Use of chlorine to fabricate trench dielectric in integrated...

Use of crystalline SiOx barriers for Si-based resonant...