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CMOS on hybrid substrate with different crystal orientations...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS on hybrid substrate with different crystal orientations...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS on SOI substrates with hybrid crystal orientations

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS optimization method utilizing sacrificial sidewall spacer

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS output circuit with enhanced ESD protection using drain...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS performance enhancement using localized voids and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS performance enhancement using localized voids and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS process for double vertical channel thin film transistor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS process for forming planarized twin wells

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS process for forming planarized twin wells

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS process forming wells after gate formation

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS process utilizing disposable silicon nitride spacers for ma

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS process with optimized PMOS and NMOS transistor devices

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS processing employing removable sidewall spacers for indepen

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS processing employing separate spacers for independently opt

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS processing employing zero degree halo implant for...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Cmos processs with low thermal budget

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS semiconductor device comprising graded junctions with reduc

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS semiconductor device containing N-channel transistor...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS semiconductor devices and method of formation

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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