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Method for forming a diode in a surface layer of an SOI substrat

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a diode protection circuit connecting to MOS

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DMOS device and a DMOS device

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Method for forming a double walled cylindrical capacitor for a D

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor by forming a trench in a pol

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor having a high dielectric...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor having improved capacitance

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor using HSG-Si

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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method for forming a DRAM capacitor using HSG-Si technique and o

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor with four polysilicon pillar

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM capacitor with porous storage node...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate

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Method for forming a DRAM capacitor with rounded horizontal fins

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM cell and array to store two-bit data

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM cell electrode

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM cell with a double-crown shaped capaci

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a dram cell with a multiple pillar-shaped cap

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Method for forming a DRAM cell with a ragged polysilicon crown-s

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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