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Multiple millisecond anneals for semiconductor device...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple operating voltage vertical replacement-gate (VRG)...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple oxide thicknesses for merged memory and logic...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple step methods for forming conformal layers

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple step methods for forming conformal layers

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple storage planes read only memory integrated circuit devi

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple thermal annealing method for a metal oxide semiconducto

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple thickness of gate oxide

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple threshold voltage semiconductor device fabrication...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple threshold voltage transistor implemented by a damascene

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Multiple-gate MOS device and method for making the same

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Multiple-gate MOS transistor using Si substrate and method...

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Multiple-gate MOSFET device and associated manufacturing...

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Multiple-gate transistors formed on bulk substrates

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Multiple-thickness gate oxide formed by oxygen implantation

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Multistage deposition that incorporates nitrogen via an...

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