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Method for forming polysilicon germanium layer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming polysilicon-germanium gate in CMOS...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming polysilicon-germanium gate in CMOS...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming protective films and spacers

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming rectangular-shaped spacers for...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming residue free patterned polysilicon layer cont

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming salicide layers

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming self-aligned contact

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming self-aligned contact

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming self-aligned contact in semiconductor device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming self-aligned contact in semiconductor device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming self-aligned contacts using a hard mask

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming semiconductor device with modified...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming silicide film in semiconductor device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming silicide regions on an integrated device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming sub-critical dimension structures in an...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming the partial salicide

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming titanium polycide gate

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming trench gate dielectric layer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method for forming vertical profile of polysilicon gate...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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